Auger- and X-Ray Photoelectron Spectroscopy in Materials Science (eBook)

A User-Oriented Guide

Siegfried Hofmann (Autor)

eBook Download: PDF

2012 | 2013
XX, 528 Seiten
Springer Berlin (Verlag)
978-3-642-27381-0 (ISBN)

Infos

To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.  

Inhalt

Auger- and X-Ray Photoelectron Spectroscopy in Materials Science 4
A User-Oriented Guide 4
Foreword 8
Preface 10
Acknowledgment 14
Contents 16
Chapter1 Introduction and Outline 21
Chapter2 Instrumentation 31
Chapter3 Qualitative Analysis (Principle and Spectral Interpretation) 62
Chapter4 Quantitative Analysis (Data Evaluation) 96
Chapter5 Optimizing Measured Signal Intensity: Emission Angle, Incidence Angle and Surface Roughness 224
Chapter6 Optimizing Certainty and the Detection Limit: Signal-to-Noise Ratio 277
Chapter7 Quantitative Compositional Depth Profiling 315
Chapter8 Practice of Surface and Interface Analysis with AES and XPS 427
Chapter9 Typical Applications of AES and XPS 468
Chapter10 Surface Analysis Techniques Related to AES and XPS 503
Index 521

Produkt-Details

• Erscheint lt. Verlag: 25.10.2012
• Reihe/Serie: Springer Series in Surface Sciences
• Reihe/Serie: Springer Series in Surface Sciences
• Zusatzinfo: XX, 528 p.
• Verlagsort: Berlin
• Sprache: englisch
• Themenwelt: Naturwissenschaften ► Physik / Astronomie ► Atom- / Kern- / Molekularphysik
• Themenwelt: Naturwissenschaften ► Physik / Astronomie ► Festkörperphysik
• Themenwelt: Technik ► Maschinenbau
• Schlagworte: Auger electron spectroscopy • Interface analysis • scanning Auger microscopy • surface analysis • thin-film depth profiling
• ISBN-10: 3-642-27381-5 / 3642273815
• ISBN-13: 978-3-642-27381-0 / 9783642273810