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Auger- and X-Ray Photoelectron Spectroscopy in Materials Science

A User-Oriented Guide
Buch | Hardcover
XX, 528 Seiten
2012 | 2013
Springer Berlin (Verlag)
978-3-642-27380-3 (ISBN)

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Auger- and X-Ray Photoelectron Spectroscopy in Materials Science - Siegfried Hofmann
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This book presents the basics of Auger- and X-Ray Photoelectron Spectroscopy in Materials Science in logical order from sample preparation and instrument setup through data acquisition to data evaluation. Offers guidance on problem-solving and worked examples.

To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.

Outline of the Technique/Brief Description.- Theoretical Background.- Instrumentation.- Practical Surface Analysis with AES.- Data Evaluation/Quantification.- Problem Solving with AES (Examples).

Erscheint lt. Verlag 25.10.2012
Reihe/Serie Springer Series in Surface Sciences
Zusatzinfo XX, 528 p.
Verlagsort Berlin
Sprache englisch
Maße 155 x 235 mm
Gewicht 935 g
Themenwelt Naturwissenschaften Chemie Analytische Chemie
Naturwissenschaften Physik / Astronomie Atom- / Kern- / Molekularphysik
Naturwissenschaften Physik / Astronomie Festkörperphysik
Technik Maschinenbau
Schlagworte Auger electron spectroscopy • Interface analysis • scanning Auger microscopy • surface analysis • thin-film depth profiling
ISBN-10 3-642-27380-7 / 3642273807
ISBN-13 978-3-642-27380-3 / 9783642273803
Zustand Neuware
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