Fundamentals of Electromigration-Aware Integrated Circuit Design
Springer International Publishing (Verlag)
978-3-319-73557-3 (ISBN)
Jens Lienig is the director of the Institute of Electromechanical and Electronic Design at Dresden University of Technology, Germany. He received his Ph.D. in the field of computer-aided physical design of multi-chip modules and was employed as a researcher at University of Virginia, Charlottesville and Concordia University, Montreal. Afterwards he worked as project manager at Tanner Research, Inc. and Robert Bosch GmbH. His main research subjects are design of electronic systems and electronic design automation. He is a member of IEEE. Matthias Thiele is a scientific assistant at Dresden University of Technology, Germany. He received his Ph.D. in the field of electromigration. Currently he works on the reliability of electronic and mechatronic systems.
Introduction.- Fundamentals of Electromigration.- Integrated Circuit Design and Electromigration.- Mitigating Electromigration in Physical Design.- Summary and Outlook.
| Erscheinungsdatum | 21.03.2018 |
|---|---|
| Zusatzinfo | XIII, 159 p. 99 illus., 95 illus. in color. |
| Verlagsort | Cham |
| Sprache | englisch |
| Maße | 155 x 235 mm |
| Gewicht | 432 g |
| Themenwelt | Mathematik / Informatik ► Informatik ► Theorie / Studium |
| Technik ► Elektrotechnik / Energietechnik | |
| Schlagworte | Blech length • Circuit Design • Current density • electromigration • Interconnect Reliability • physical design • reservoir effect • short-length effects • short-line rules • VLSI Design |
| ISBN-10 | 3-319-73557-8 / 3319735578 |
| ISBN-13 | 978-3-319-73557-3 / 9783319735573 |
| Zustand | Neuware |
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