Microlithography

Science and Technology, Second Edition

Bruce W. Smith, Kazuaki Suzuki (Herausgeber)

Buch | Hardcover

864 Seiten

2007 | 2nd edition
Crc Press Inc (Verlag)
978-0-8247-9024-0 (ISBN)

Infos

Describes both elementary and advanced aspects of sub micron micro lithography. This text covers optics, excimer laser light sources, and alignment techniques and analysis, as well as resist chemistry, multilayer lithography, plasma and reactive ion etching, and metrology. It discusses electron beam, x-ray and proximal probe techniques.

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This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts.

New in the Second EditionIn addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including:



Immersion Lithography
157nm Lithography
Electron Projection Lithography (EPL)
Extreme Ultraviolet (EUV) Lithography
Imprint Lithography
Photoresists for 193nm and Immersion Lithography
Scatterometry

Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition.

Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.

Autor

Edited by Kazuaki Suzuki, Nikon Corporation, Saitama, Japan, Saitama, 360-8559, Japan Edited by Bruce W. Smith, Rochester Institute of Technology, New York, USA, Rochester NY, U.S.A

Inhalt

EXPOSURE SYSTEM. System Overview of Optical Steppers and Scanners. Optical Lithography Modeling. Optics for Photolithography. Excimer Laser for Advanced Microlithography. Alignment and Overlay. Electron Beam Lithography System. X-Ray Lithography. EUV Lithography. Imprint Lithography. RESISTS AND PROCESSING. Chemistry of Photoresist Materials. Resist Processing. Multilayer Resist Technology. Dry Etching of Photoresists. METROLOGY AND NANOLITHOGRAPHY. Critical-Dimensional Metrology for Integrated-Circuit Technology. Electron Beam Nanolithography. Index.

Produkt-Details

• Erscheint lt. Verlag: 11.5.2007
• Zusatzinfo: 41 Tables, black and white; 36 Halftones, black and white; 541 Illustrations, black and white
• Verlagsort: Bosa Roca
• Sprache: englisch
• Maße: 178 x 254 mm
• Gewicht: 1632 g
• Themenwelt: Technik ► Elektrotechnik / Energietechnik
• ISBN-10: 0-8247-9024-3 / 0824790243
• ISBN-13: 978-0-8247-9024-0 / 9780824790240
• Zustand: Neuware