Microlithography
Science and Technology
Seiten
1998
Marcel Dekker Inc (Verlag)
978-0-8247-9953-3 (ISBN)
Marcel Dekker Inc (Verlag)
978-0-8247-9953-3 (ISBN)
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Details elementary and advanced aspects of submicron microlithography. This book covers theoretical and operating practices as well as information on research in the field. It includes discussions on electron beam, x-ray, and proximal probe techniques.
This self-contained text details both elementary and advanced aspects of submicron microlithography - providing a balanced treatment of theoretical and operating practices as well as complete information on current research in the field. Including discussions on electron beam, x-ray, and proximal probe techniques and enhanced with timesaving citations to key sources in the literature and more than 600 tables, equations, drawings, and photographs that clarify the material, the book covers mechanical systems, optics, excimer laser light sources, alignment techniques and analysis, resist chemistry, processing, multilayer lithography, plasma and reactive ion etching, metrology, and more.
This self-contained text details both elementary and advanced aspects of submicron microlithography - providing a balanced treatment of theoretical and operating practices as well as complete information on current research in the field. Including discussions on electron beam, x-ray, and proximal probe techniques and enhanced with timesaving citations to key sources in the literature and more than 600 tables, equations, drawings, and photographs that clarify the material, the book covers mechanical systems, optics, excimer laser light sources, alignment techniques and analysis, resist chemistry, processing, multilayer lithography, plasma and reactive ion etching, metrology, and more.
EXPOSURE SYSTEMS
System Overview of Optical Steppers and Scanners, M.S. Hibbs
Optical Lithography Modeling, C.A. Mack
Optics for Photolithography, B.W. Smith
Krypton Fluoride Excimer Laser for Advanced Microlithography, P. Das and U. Sengupta
Alignment and Overlay, G.M. Gallatin
Electron Beam Lithography Systems, G. Owen and J.R. Sheats
X-Ray Lithography, T. Ueno and J.R. Sheats
RESISTS AND PROCESSING
Chemistry of Photoresist Materials, T. Ueno
Resist Processing, B.W. Smith
Multilayer Resist Technology, B.W. Smith and M. Hanratty
Dry Etching of Photoresists, R.R. Kunz
METROLOGY AND NANOLITHOGRAPHY
Dimensional Metrology, H.M. Marchman
E-Beam and Proximal Probe Processes for Nanolithography, E.A. Dobisz, F.K. Perkins, and M.C. Peckerar
| Erscheint lt. Verlag | 27.5.1998 |
|---|---|
| Verlagsort | New York |
| Sprache | englisch |
| Maße | 152 x 229 mm |
| Gewicht | 1043 g |
| Themenwelt | Technik ► Elektrotechnik / Energietechnik |
| ISBN-10 | 0-8247-9953-4 / 0824799534 |
| ISBN-13 | 978-0-8247-9953-3 / 9780824799533 |
| Zustand | Neuware |
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