Thin Films and Heterostructures for Oxide Electronics
Springer-Verlag New York Inc.
978-0-387-25802-7 (ISBN)
Ferroelectrics, Nano-scale phenomena, High k Dielectrics.- Nanoscale Phenomena in Ferroelectric Thin Films.- High-K Candidates for Use as the Gate Dielectric in Silicon Mosfets.- Science and Technology of High-Dielectric Constant (K) Thin Films for Next Generation CMOS.- Magnetic Memory and Spintronics.- Materials Requirements for Magnetic Random-Access Memory (MRAM) Devices.- Manganite, Magnetite, and Double- Perovskite Thin Films and Heterostructures.- Interfaces and Surfaces: Correlated Electron Systems.- Interfaces in Materials with Correlated Electron Systems.- Electronic Reconstruction at Surfaces and Interfaces of Correlated Electron Materials.- Wide Band Gap Semiconductors.- Wide Band Gap ZnO and ZnMgO Heterostructures for Future Optoelectronic Devices.- Combinatorial Synthesis and Materials Discovery.- Combinatorial Synthesis of Functional Metal Oxide Thin Films.- Diluted Magnetic Oxide Systems.- Film Growth and Real-Time in situ Characterization.- Real-Time Growth Monitoring by High-Pressure Rheed During Pulsed Laser Deposition.- Recent Advances in the Deposition of Multi-Component Oxide Films by Pulsed Energy Deposition.- Epitaxial Growth and Properties of Magnetically Doped TiO2.
Reihe/Serie | Multifunctional Thin Film Series |
---|---|
Zusatzinfo | X, 420 p. |
Verlagsort | New York, NY |
Sprache | englisch |
Maße | 155 x 235 mm |
Themenwelt | Technik ► Elektrotechnik / Energietechnik |
Technik ► Maschinenbau | |
ISBN-10 | 0-387-25802-7 / 0387258027 |
ISBN-13 | 978-0-387-25802-7 / 9780387258027 |
Zustand | Neuware |
Haben Sie eine Frage zum Produkt? |
aus dem Bereich