Thin Films and Heterostructures for Oxide Electronics
Springer-Verlag New York Inc.
978-1-4419-3838-1 (ISBN)
Ferroelectrics, Nano-scale phenomena, High k Dielectrics.- Nanoscale Phenomena in Ferroelectric Thin Films.- High-K Candidates for Use as the Gate Dielectric in Silicon Mosfets.- Science and Technology of High-Dielectric Constant (K) Thin Films for Next Generation CMOS.- Magnetic Memory and Spintronics.- Materials Requirements for Magnetic Random-Access Memory (MRAM) Devices.- Manganite, Magnetite, and Double- Perovskite Thin Films and Heterostructures.- Interfaces and Surfaces: Correlated Electron Systems.- Interfaces in Materials with Correlated Electron Systems.- Electronic Reconstruction at Surfaces and Interfaces of Correlated Electron Materials.- Wide Band Gap Semiconductors.- Wide Band Gap ZnO and ZnMgO Heterostructures for Future Optoelectronic Devices.- Combinatorial Synthesis and Materials Discovery.- Combinatorial Synthesis of Functional Metal Oxide Thin Films.- Diluted Magnetic Oxide Systems.- Film Growth and Real-Time in situ Characterization.- Real-Time Growth Monitoring by High-Pressure Rheed During Pulsed Laser Deposition.- Recent Advances in the Deposition of Multi-Component Oxide Films by Pulsed Energy Deposition.- Epitaxial Growth and Properties of Magnetically Doped TiO2.
Erscheint lt. Verlag | 8.12.2010 |
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Reihe/Serie | Multifunctional Thin Film Series |
Zusatzinfo | X, 420 p. |
Verlagsort | New York, NY |
Sprache | englisch |
Maße | 155 x 235 mm |
Themenwelt | Naturwissenschaften ► Chemie ► Analytische Chemie |
Naturwissenschaften ► Physik / Astronomie ► Festkörperphysik | |
Naturwissenschaften ► Physik / Astronomie ► Thermodynamik | |
Technik ► Elektrotechnik / Energietechnik | |
Technik ► Maschinenbau | |
ISBN-10 | 1-4419-3838-9 / 1441938389 |
ISBN-13 | 978-1-4419-3838-1 / 9781441938381 |
Zustand | Neuware |
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