Plasma Sources for Thin Film Deposition and Etching
Seiten
1994
Academic Press Inc (Verlag)
978-0-12-533018-3 (ISBN)
Academic Press Inc (Verlag)
978-0-12-533018-3 (ISBN)
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Includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalanced magnetron sputtering, and particle formation in thin film processing plasma.
This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma.
This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma.
Design of High- Density Plasma Sources for Materials Processing M.A. Lieberman and R.A. Gottscho Electron Cyclotron Resonance Plasma Sources and Their Use in Plasma-Assisted Chemical Vapor Deposition of Thin Films O.A. Popov Unbalanced Magnetron Sputtering S.L. Rohde The Formation of Particles in Thin-Film Processing Plasmas Steinbruchel
| Erscheint lt. Verlag | 29.9.1994 |
|---|---|
| Reihe/Serie | Physics of Thin Films |
| Mitarbeit |
Herausgeber (Serie): John L. Vossen |
| Verlagsort | San Diego |
| Sprache | englisch |
| Maße | 152 x 229 mm |
| Gewicht | 720 g |
| Themenwelt | Naturwissenschaften ► Physik / Astronomie ► Festkörperphysik |
| Naturwissenschaften ► Physik / Astronomie ► Hochenergiephysik / Teilchenphysik | |
| Naturwissenschaften ► Physik / Astronomie ► Plasmaphysik | |
| ISBN-10 | 0-12-533018-9 / 0125330189 |
| ISBN-13 | 978-0-12-533018-3 / 9780125330183 |
| Zustand | Neuware |
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