Laser Crystallization of Silicon - Fundamentals to Devices (eBook)

Norbert H. Nickel (Autor)

eBook Download: PDF

2003 | 1. Auflage
204 Seiten
Elsevier Science (Verlag)
978-0-08-054094-8 (ISBN)

Infos

This book on the Laser Crystallization of Silicon reviews the latest experimental and theoretical studies in the field. It has been written by recognised global authorities and covers the most recent phenomena related to the laser crystallization process and the properties of the resulting polycrystalline silicon.
Reflecting the truly interdisciplinary nature of the field that the series covers, this volume will continue to be of great interest to physicists, chemists, materials scientists and device engineers in modern industry.

Valuable applications for industry, particularly in the fabrication of thin-film electronics
Each chapter has been peer reviewed
An important and timely contribution to the semiconductor literature

Inhalt

Cover 1
TOC$Contents 6
List of Contributors 10
Preface 12
CH$Chapter 1. Introduction to Laser Crystallization of Silicon 14
References 22
CH$Chapter 2. Heat Transfer and Phase Transformations in Laser Melting and Recrystallization of Amorphous Thin Si Films 24
1. Introduction 24
2. Crystal Growth Mechanisms 25
3. Temperature Field in Excimer Laser Annealing 28
4. Nucleation in the Supercooled Liquid 34
5. Analysis of Optical Diagnostics Measured During Laser Recrystallization 36
6. Lateral Growth by Spatially Modified Irradiation 40
7. Ultra-Large Lateral Grain Growth by Double-laser Recrystallization 43
8. Conclusions 52
Acknowledgements 53
References 53
CH$Chapter 3. Modeling Laser-Induced Phase-Change Processes: Theory and Computation 56
1. Introduction 56
2. Interaction of Pulsed Laser with Semiconductors 57
3. Pulsed Laser-Induced Phase-Change Processes 61
4. Mathematical Models 71
5. Examples of Computational Results 79
6. Conclusions 88
Acknowledgment 89
References 89
CH$Chapter 4. Laser Interference Crystallization of Amorphous Films 92
1. Introduction 92
2. The Laser Interference Crystallization Technique 98
3. Structural Properties of Laser-Crystallized Layers 102
4. Spectroscopic Studies of Laser-Crystallized a-Si 107
5. Dynamics of the Crystallization Process 113
6. Interference Crystallization of Amorphous Germanium Films 120
7. Conclusions and Future Perspectives 127
References 129
CH$Chapter 5. Structural and Electronic Properties of Laser-Crystallized Poly-Si 132
1. Introduction 132
2. Experimental 134
3. Successive Crystallization 139
4. Grains and Grain-Boundary Defects 142
5. Stress in Undoped Laser Crystallized Poly-Si 149
6. Texture of Laser-Crystallized Poly-Si 158
7. Influence of Doping on the Crystallization Parameters 163
8. Electronic Properties of Heavily Doped Poly-Si 168
9. Summary and Future Directions 182
Acknowledgements 183
References 183
IDX$Index 186
Contents of Volumes in This Series 192

Produkt-Details

• Erscheint lt. Verlag: 12.12.2003
• Sprache: englisch
• Themenwelt: Naturwissenschaften ► Chemie ► Anorganische Chemie
• Themenwelt: Naturwissenschaften ► Physik / Astronomie
• Themenwelt: Technik ► Elektrotechnik / Energietechnik
• Themenwelt: Technik ► Maschinenbau
• ISBN-10: 0-08-054094-5 / 0080540945
• ISBN-13: 978-0-08-054094-8 / 9780080540948