Nicht aus der Schweiz? Besuchen Sie lehmanns.de
Low Energy Ion Beam and Plasma Modification of Materials: Volume 223 -

Low Energy Ion Beam and Plasma Modification of Materials: Volume 223

Buch | Hardcover
418 Seiten
1991
Materials Research Society (Verlag)
978-1-55899-117-0 (ISBN)
CHF 47,10 inkl. MwSt
  • Titel ist leider vergriffen;
    keine Neuauflage
  • Artikel merken
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Part I. Fundamentals of Ion-Material Interactions; Part II. Microwave Ion Sources for Deposition and Etching; part I. Fabrication processes and physical properties T. T. Chau, S. R. Mejia and K. C. Kao; 11. Structural and interfacial characteristics of thin (<10 nm) SiO2 films grown by electron cyclotron resonance plasma oxidation on [100] si substrates Tai D. Nguyen, D. A. Carl, D. W. Hess, M. A. Lieberman and R. Gronsky; 12. Cubic brown nitride prepared by an ECR plasma Y. Osaka, M. Okamoto and Y. Utsumi; 13. The ECR-plasma deposition of silicon nitride on a tunnel oxide J. C. Barbour, H. J. Stein and C. A. Outten; 14. ECR plasma etching technology for ULSIs Seiji Samukawa; 15. The mechanisms of reactive ion etching of SiOx (x<2) with electron cyclotron resonance and Kaufman ion sources R. A. Kant, C. R. Eddy, Jr, and B. D. Sartwell; 16. Shallow p+-n junction fabrication by plasma immersion ion implantation C. A. Pico, X. Y. Qian, E. Jones, M. A. Lieberman and N. W. Chang; 17. Electron cyclotron resonance hydrogenation of poly-si thin film transistors on SiO2/Si substrates Gand Liu, Robert A. Ditizio, Stephen J. Fonash and Nang Tran; 18. Electron cyclotron resonance hydrogen plasma induced defects in thermally grown and sputter depositied SiO2 W. L. Hallett, R. A. Ditizio and S. J. Fonash; Part III. Processing of High Tc Thin Films and Interfaces; Part III. Processing of High Tc Thin Films and Interfaces; Part IV. Electronic Materials; Part V. Electronic Materials; Part VI. Ion Processing of Oxides, Nitrides, Polymers and Carbon; Part VII. Ion Processing of Metals.

Reihe/Serie MRS Proceedings
Zusatzinfo Worked examples or Exercises
Sprache englisch
Maße 152 x 229 mm
Gewicht 730 g
Themenwelt Naturwissenschaften Physik / Astronomie Hochenergiephysik / Teilchenphysik
Naturwissenschaften Physik / Astronomie Plasmaphysik
Technik Maschinenbau
ISBN-10 1-55899-117-4 / 1558991174
ISBN-13 978-1-55899-117-0 / 9781558991170
Zustand Neuware
Haben Sie eine Frage zum Produkt?
Mehr entdecken
aus dem Bereich
Why Does Gravity Rule?

von CLOSE

Buch | Hardcover (2024)
Oxford University Press (Verlag)
CHF 31,90
In Search of the Elusive and Mysterious Neutrino

von Alan Chodos; James Riordon

Buch | Softcover (2024)
MIT Press (Verlag)
CHF 39,95