Atomic Layer Growth and Processing: Volume 222
Seiten
1991
Materials Research Society (Verlag)
978-1-55899-116-3 (ISBN)
Materials Research Society (Verlag)
978-1-55899-116-3 (ISBN)
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The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Featuring 46 papers from the 1991 MRS Spring Meeting (April 29 - May 3, Anaheim, California), this volume focuses on the technologically challenging field of atomic layer growth and processing. The concept of atomic layer based processing is perhaps a primary road to both the degree of control and processing uniformity for both etching and deposition that the future demands of the semiconductor industry require. Research areas covered include: mechanistic studies of atomic layer processes; characterization of atomic layer processes; III-V semiconductor studies; group IV semiconductor studies; II-VI semiconductor studies; high Tc superconductors and other materials.
Featuring 46 papers from the 1991 MRS Spring Meeting (April 29 - May 3, Anaheim, California), this volume focuses on the technologically challenging field of atomic layer growth and processing. The concept of atomic layer based processing is perhaps a primary road to both the degree of control and processing uniformity for both etching and deposition that the future demands of the semiconductor industry require. Research areas covered include: mechanistic studies of atomic layer processes; characterization of atomic layer processes; III-V semiconductor studies; group IV semiconductor studies; II-VI semiconductor studies; high Tc superconductors and other materials.
Erscheint lt. Verlag | 11.10.1991 |
---|---|
Reihe/Serie | MRS Proceedings |
Zusatzinfo | Worked examples or Exercises |
Sprache | englisch |
Themenwelt | Naturwissenschaften ► Physik / Astronomie ► Elektrodynamik |
Technik ► Maschinenbau | |
ISBN-10 | 1-55899-116-6 / 1558991166 |
ISBN-13 | 978-1-55899-116-3 / 9781558991163 |
Zustand | Neuware |
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