Soft X-Rays and Extreme Ultraviolet Radiation
Principles and Applications
Seiten
1999
Cambridge University Press (Verlag)
978-0-521-65214-8 (ISBN)
Cambridge University Press (Verlag)
978-0-521-65214-8 (ISBN)
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This self-contained, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The book will be of great interest to graduate students, researchers and practising engineers.
This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.
This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.
1. Introduction; 2. Radiation and scattering at EUV and soft X-ray wavelengths; 3. Wave propagation and refractive index at EUV and soft X-ray wavelengths; 4. Multilayer interference coatings; 5. Synchrotron radiation; 6. Physics of hot-dense plasmas; 7. Extreme ultraviolet and soft X-ray lasers; 8. Coherence at short wavelengths; 9. X-Ray microscopy with diffractive optics; 10. Extreme ultraviolet and X-ray lithography; Appendices.
| Erscheint lt. Verlag | 28.8.1999 |
|---|---|
| Zusatzinfo | 255 Halftones, unspecified |
| Verlagsort | Cambridge |
| Sprache | englisch |
| Maße | 184 x 261 mm |
| Gewicht | 1055 g |
| Themenwelt | Technik |
| ISBN-10 | 0-521-65214-6 / 0521652146 |
| ISBN-13 | 978-0-521-65214-8 / 9780521652148 |
| Zustand | Neuware |
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