Electron Beams in a Plasma

Evgeniy G. Shustin (Autor)

Buch | Hardcover

114 Seiten

2024 | Unabridged edition
Cambridge Scholars Publishing (Verlag)
978-1-0364-0544-1 (ISBN)

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This book contains information on scientific research and applications of a very diverse field of low temperature plasma physics – the interaction of electron beams with plasma and, as a consequence of this interaction, a beam plasma discharge. It contains detailed descriptions of the history of the relevant research, a review of experimental research of properties of the low-temperature plasma with an electron beam and beam plasma discharge, and presents the main results of beam plasma interaction theory. Most of the book is devoted to descriptions of applications of the plasma with a beam and beam plasma discharge in a variety of fields; from studies of the physics of near-Earth space using active geophysical experiments to the development of materials technologies for micro- and nanoelectronics and designs of plasma-filled electronic devices. This book will be useful as an introduction to this field for undergraduate and graduate students specializing in plasma physics, as well as for other specialists in various fields of physics and technologies.

Evgeniy G. Shustin graduated from Saratov State University in 1962, Russia (formerly the USSR). He obtained his DSci in Physical electronics in 1987, specializing in the laboratory simulation of effects of electron beam interaction with a plasma in the upper atmosphere. He became a junior researcher at the V.A. Kotelnikov Institute of Radio Engineering and Electronics of RAS, Russia, in 1962, later becoming a principal researcher. His general scientific interests are physics of low temperature plasma, plasma electronics, and plasma processing reactors and technologies. Shustin has authored and co-authored around 120 scientific papers in leading journals on plasma physics, including "Etching of "Microwire-on-Insulator"-type structures", "Beam–plasma discharge in space and in a lab", and "Simulation of sputtering from an isolated conductor surrounded by a dielectric during plasma etching".

Erscheinungsdatum	22.08.2024
Verlagsort	Newcastle upon Tyne
Sprache	englisch
Maße	148 x 212 mm
Themenwelt	Naturwissenschaften ► Physik / Astronomie ► Plasmaphysik
Themenwelt	Technik ► Elektrotechnik / Energietechnik
ISBN-10	1-0364-0544-3 / 1036405443
ISBN-13	978-1-0364-0544-1 / 9781036405441
Zustand	Neuware