Handbook of Semiconductor Manufacturing Technology
Crc Press Inc (Verlag)
978-1-57444-675-3 (ISBN)
Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available.
Stay Current with the Latest Technologies
In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on…
Silicon-on-insulator (SOI) materials and devices
Supercritical CO2 in semiconductor cleaning
Low-κ dielectrics
Atomic-layer deposition
Damascene copper electroplating
Effects of terrestrial radiation on integrated circuits (ICs)
Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication.
While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.
Texas Instruments, Dallas, USA Stanford University, California, USA
Introduction to Semiconductor Devices. Overview of Interconnect-Copper and Low-κ Integration. Silicon Materials. SOI Materials and Devices. Surface Preparation. Supercritical Carbon Dioxide in Semiconductor Cleaning. Ion Implantation. Dopant Diffusion. Oxidation and Gate Dielectrics. Silicides. Rapid Thermal Processing. Low-κ Dielectrics. Chemical Vapor Deposition. Atomic Layer Deposition. Physical Vapor Deposition. Damascene Copper Electroplating. Chemical-Mechanical Polishing. Optical Lithography. Photoresist Materials and Processing. Photomask Fabrication. Plasma Etch. Equipment Reliability. Overview of Process Control. In-Line Metrology. In-Situ Metrology. Yield Modeling. Yield Management. Electrical, Physical, and Chemical Characterization. Failure Analysis. Reliability Physics. Effects of Terrestrial Radiation on Integrated Circuits. Integrated-Circuit Packaging. 300 mm Wafer Fab Logistics and Automated Material Handling Systems. Factory Modeling. Economics of Semiconductor Manufacturing. Appendix A: Physical Constants. Appendix B: Units Conversion. Appendix C: Standards Commonly Used in Semiconductor Manufacturing. Appendix D: Acronyms. Index.
| Erscheint lt. Verlag | 9.7.2007 |
|---|---|
| Zusatzinfo | 227 Tables, black and white; 179 Halftones, black and white; 1051 Illustrations, black and white |
| Verlagsort | Bosa Roca |
| Sprache | englisch |
| Maße | 178 x 254 mm |
| Gewicht | 2572 g |
| Themenwelt | Technik ► Elektrotechnik / Energietechnik |
| ISBN-10 | 1-57444-675-4 / 1574446754 |
| ISBN-13 | 978-1-57444-675-3 / 9781574446753 |
| Zustand | Neuware |
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