Handbook of Photomask Manufacturing Technology
Crc Press Inc (Verlag)
978-0-8247-5374-0 (ISBN)
- Titel z.Zt. nicht lieferbar
- Versandkostenfrei
- Auch auf Rechnung
- Artikel merken
As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask Manufacturing Technology is the first in-depth, comprehensive treatment of existing and emerging photomask technologies available.
The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation.
Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies.
Syed Rizvi
Introduction. Introduction to Mask Making. Mask Writing. Data Preparation. Mask Writers: An Overview. E-Beam Mask Writers. Laser Mask Writers. Optical Masks. Optical masks: An Overview. Conventional Optical Masks. Advanced Optical Masks. NGL Masks. NGL Masks: An Overview. Masks for Electron Beam Projection Lithography. Masks for Extreme Ultraviolet Lithography. Masks for Ion Projection Lithography. Mask for Proximity X-Ray Lithography. Mask Processing, Materials, and Pellicles. Mask Substrate. Resists for Mask Making. Resist Charging and Heating. Mask Processing. Mask Materials: Optical Properties. Pellicles. Mask Metrology, Inspection, Evaluation, and Repairs. Photomask Feature Metrology. Optical Critical Dimension Metrology. Photomask Critical Dimension Metrology in the Scanning Electron Microscope. Geometrical Characterization of Mask Using SPM. Metrology of Image Placement. Optical Thin Film Metrology for Photomask Applications. Phase Measurement Tool for PSM. Mask Inspection: Theories and Principle. Tool for Inspecting Masks: Lasertec MD 2500. Tool for Mask Image Evaluation. Mask Repairs. Modeling and Simulation. Modeling and Simulation. Index.
| Erscheint lt. Verlag | 7.4.2005 |
|---|---|
| Zusatzinfo | 43 Tables, black and white; 128 Halftones, black and white; 384 Illustrations, black and white |
| Verlagsort | Bosa Roca |
| Sprache | englisch |
| Maße | 178 x 254 mm |
| Gewicht | 1510 g |
| Themenwelt | Technik ► Elektrotechnik / Energietechnik |
| ISBN-10 | 0-8247-5374-7 / 0824753747 |
| ISBN-13 | 978-0-8247-5374-0 / 9780824753740 |
| Zustand | Neuware |
| Haben Sie eine Frage zum Produkt? |
aus dem Bereich
