Laser Heat-Mode Lithography

Principle and Methods

Jingsong Wei (Autor)

Buch | Softcover

208 Seiten

2020 | 1st ed. 2019
Springer Verlag, Singapore
978-981-15-0945-2 (ISBN)

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This book provides a systematic description and analysis of laser heat-mode lithography, addressing the basic principles, lithography system, manipulation of feature size, grayscale lithography, resist thin films, and pattern transfer, while also presenting typical experimental results and applications. It introduces laser heat-mode lithography, where the resist thin films are essentially an opto-thermal response to the laser beam with changeable wavelength and are not sensitive to laser wavelength. Laser heat-mode lithography techniques greatly simplify production procedures because they require neither a particular light source nor a particular environment; further, there are no pre-baking and post-baking steps required for organic photoresists. The pattern feature size can be either larger or smaller than the laser spot by adjusting the writing strategy. The lithographic feature size can also be arbitrarily tuned from nanoscale to micrometer without changing the laser spot size.Lastly, the line edge roughness can be controlled at a very low value because the etching process is a process of breaking bonds among atoms. The book offers an invaluable reference guide for all advanced undergraduates, graduate students, researchers and engineers working in the fields of nanofabrication, lithography techniques and systems, phase change materials, etc.

Jingsong Wei received the Ph.D. degree in Chinese Academy of Sciences. He is currently a Professor with Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences. He has published more than 120 articles in professional journals including Applied Physics Letters, Optics Express, Optics Letters, etc. His research interests include miro/nanolithography, super-resolution optics, and optical instruments.

Current status of lithography.- Principles of laser heat-mode lithography and thermal diffusion.- Laser heat-mode maskless lithography system.- Manipulation of thermal diffusion channels.- Laser heat-mode nanolithography on phase-change thin films.- Direct laser heat-mode nanopatterning on metallo-organic compound thin films.- Laser heat-mode patterning of transparent thin films.- Laser heat-mode grayscale image lithography.- Patterns transfer processes and applications.

Erscheinungsdatum	16.01.2021
Reihe/Serie	Springer Series in Materials Science ; 291
Zusatzinfo	160 Illustrations, color; 22 Illustrations, black and white; XIII, 208 p. 182 illus., 160 illus. in color.
Verlagsort	Singapore
Sprache	englisch
Maße	155 x 235 mm
Themenwelt	Naturwissenschaften ► Physik / Astronomie ► Atom- / Kern- / Molekularphysik
	Naturwissenschaften ► Physik / Astronomie ► Festkörperphysik
	Naturwissenschaften ► Physik / Astronomie ► Optik
	Naturwissenschaften ► Physik / Astronomie ► Theoretische Physik
	Technik ► Elektrotechnik / Energietechnik
Schlagworte	Arbitrary pattern writing • Maskless lithography • Metallo-organic compound • phase change • thermal diffusion
ISBN-10	981-15-0945-X / 981150945X
ISBN-13	978-981-15-0945-2 / 9789811509452
Zustand	Neuware