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1999 4th International Symposium on Plasma Process-Induced Damage

IEEE Electron Devices Society (Autor)

Buch | Softcover

224 Seiten

1999 | 1999, 4th ed.
I.E.E.E.Press (Verlag)
978-0-9651577-3-5 (ISBN)

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This text constitutes the proceedings from the International Symposium on Plasma Process-Induced Damage, which took place in 1999. Topics covered include plasma equipment, electron shading, device characterization and backend process integration.

Plasma Equipment; Pattern Dependent Charging Effects; Electron Shading; Device Characterization; Charging Theory and Thin Gate Oxides; Equipment Enhancement; Thin Gate Oxide and Dielectrics; Frequency and Time Modulation Effects; Backend Process Integration; Charging Mechanisms and Measurements 001 0780351894

Erscheint lt. Verlag	30.9.1999
Verlagsort	Piscataway NJ
Sprache	englisch
Maße	216 x 279 mm
Themenwelt	Naturwissenschaften ► Physik / Astronomie ► Plasmaphysik
Themenwelt	Technik ► Elektrotechnik / Energietechnik
ISBN-10	0-9651577-3-3 / 0965157733
ISBN-13	978-0-9651577-3-5 / 9780965157735
Zustand	Neuware