Ion Sources

Huashun Zhang (Autor)

Buch | Hardcover

XVIII, 476 Seiten

1999 | 1999
Springer Berlin (Verlag)
978-3-540-65747-7 (ISBN)

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Ion implantation has become a basic technology in device manufacturing. For efficient use of this accelerator-based technique the choice of appropriate ion sources is important. This book deals with the design and operation of ion sources. Additionally the physics of ion formation of the various elements with different charge states and charge neutralization are discussed. Ion selection and beam diagnostics are part of the book too. The presentation of the necessary equations and diagrams for the various parameters makes this book useful as a handbook for ion sources.

Introduction.- Gas Discharge Fundamentals.- Extraction System for Ion Sources.- Positive Ion Sources.- Giant Ion Sources.- Multiply Charged Ion Sources.- Mass and Energy Spectra of Ion Sources.- Negative Ion Sources.- Self-Neutralization of Beam Space Charge.- Beam Diagnostics for Ion Sources.

Erscheint lt. Verlag	8.11.1999
Zusatzinfo	XVIII, 476 p.
Verlagsort	Berlin
Sprache	englisch
Maße	155 x 235 mm
Gewicht	895 g
Themenwelt	Naturwissenschaften ► Physik / Astronomie ► Atom- / Kern- / Molekularphysik
	Naturwissenschaften ► Physik / Astronomie ► Hochenergiephysik / Teilchenphysik
	Technik ► Maschinenbau
Schlagworte	Ionisierende Strahlung • Ionisierende Strahlung / Ionenstrahlung
ISBN-10	3-540-65747-9 / 3540657479
ISBN-13	978-3-540-65747-7 / 9783540657477
Zustand	Neuware