Epitaxy
Springer Berlin (Verlag)
978-3-642-08737-0 (ISBN)
Epitaxy provides readers with a comprehensive treatment of the modern models and modifications of epitaxy, together with the relevant experimental and technological framework. This advanced textbook describes all important aspects of the epitaxial growth processes of solid films on crystalline substrates, including a section on heteroepitaxy. It covers and discusses in details the most important epitaxial growth techniques, which are currently widely used in basic research as well as in manufacturing processes of devices, namely solid-phase epitaxy, liquid-phase epitaxy, vapor-phase epitaxy, including metal-organic vapor-phase epitaxy and molecular-beam epitaxy. Epitaxy's coverage of science and texhnology thin-film is intended to fill the need for a comprehensive reference and text examining the variety of problems related to the physical foundations and technical implementation of epitaxial crystallization.
I. Basic Concepts.- 1. Introduction.- 2. Homo- and Heteroepitaxial Crystallization Phenomena.- 3. Application Areas of Epitaxially Grown Layer Structures.- II. Technical Implementation.- 4. Solid Phase Epitaxy.- 5. Liquid Phase Epitaxy.- 6. Vapor Phase Epitaxy.- 7. Molecular Beam Epitaxy.- 8. Metal Organic Vapor Phase Epitaxy.- III. In-situ Analysis of the Growth Processes.- 9. In-situ Analysis of Species and Transport.- 10. In-situ Surface Analysis.- IV. Physics of Epitaxy.- 11. Thermodynamic Aspects.- 12. Atomistic Aspects.- 13. Quantum Mechanical Aspects.- V. Heteroepitaxy.- 14. Heteroepitaxy; Growth Phenomena.- 15. Material-Related Problems of Heteroepitaxy.- 16. Closing Remarks.- References.- List of Abbreviations.- List of Metalorganic Precursors.
From the reviews:
"Epitaxy has become increasingly important ... . Still, a good monograph on this issue was lacking .... This gap is finally filled with a book that finds a good equilibrium ... . As such, it will be very useful to students who are interested in advanced thin film growth, and researchers active in the field of low-dimensional heterostructures. ... Throughout the work, a large number of references are cited ... . this book will be a good guide for people interested in the growth and properties of low dimensional heterostructures and nanostructures." (André Vantomme, Physicalia, Vol. 57 (3), 2005)
"The book ... contains experimental and theoretical aspects of the epitaxial growth process including very recent developments in a compact and clear manner. ... represents a good opportunity for the interested reader to get used to the field of epitaxial growth of materials and should be of high interest to students, scientists, and engineers working in the field of material research, device research, and solid state physics or -chemistry. ... this book should become a indispensable source of information for all crystal growers." (V. Gottschalch, Zeitschrift für Kristallographie, Issue: 11, 2004)
"In a uniform and comprehensive manner the authors describe all the important aspects of the epitaxial growth processes of solid films on crystalline substrates ... . Emphasis is put on sufficiently fundamental and unequivocal presentation of the subject in the form of an easy-to-read review." (Zeitschrift für Kristallographie, Issue: 10, 2004)
| Erscheint lt. Verlag | 1.12.2010 |
|---|---|
| Reihe/Serie | Springer Series in Materials Science |
| Zusatzinfo | XV, 525 p. 303 illus. |
| Verlagsort | Berlin |
| Sprache | englisch |
| Maße | 155 x 235 mm |
| Gewicht | 804 g |
| Themenwelt | Naturwissenschaften ► Physik / Astronomie ► Atom- / Kern- / Molekularphysik |
| Naturwissenschaften ► Physik / Astronomie ► Festkörperphysik | |
| Technik ► Maschinenbau | |
| Schlagworte | Crystal • Epilayers in device structures • Epitaxy • Helium-Atom-Streuung • Heterostructures • Strained layer growth • Thin film crystallization and characterization • Vapor |
| ISBN-10 | 3-642-08737-X / 364208737X |
| ISBN-13 | 978-3-642-08737-0 / 9783642087370 |
| Zustand | Neuware |
| Haben Sie eine Frage zum Produkt? |
aus dem Bereich
