Plasma Deposition of Amorphous Silicon-Based Materials (eBook)

Pio Capezzuto, Arun Madan (Herausgeber)

eBook Download: PDF

1995 | 1. Auflage
324 Seiten
Elsevier Science (Verlag)
978-0-08-053910-2 (ISBN)

Infos

Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced.

Key Features
* Focuses on the plasma chemistry of amorphous silicon-based materials
* Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced
* Features an international group of contributors
* Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices

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Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. - Focuses on the plasma chemistry of amorphous silicon-based materials- Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced- Features an international group of contributors- Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices

Inhalt

Cover 1
Plasma Deposition of Amorphous Silicon-Based Materials 4
Copyright Page 5
Contents 6
Contributors 10
Preface 12
Chapter 1. Chemistry of Amorphous Silicon Deposition Processes: Fundamentals and Controversial Aspects 14
I. Introduction 14
II. Some Fundamentals on Plasma Deposition 17
III. Chemical Systems for Amorphous Silicon and Its Alloys 39
IV. Effect of Novel Parameters 49
V. Deposition Mechanisms and Controversial Aspects 65
References 70
Chapter 2. Diagnostics of Amorphous Silicon (a-Si) Plasma Processes 76
I. Introduction 77
II. Optical Diagnostics 78
III. Mass Spectrometry and Langmuir Probes 95
IV. In Situ Studies of the Growth of a-Si:H by Spectroellipsometry 115
References 138
Chapter 3. Deposition Conditions and the Optoelectronic Properties of a-Si:H Alloys 144
I. Introduction 144
II. General Comments on Amorphous Alloy Growth 146
III. Relationship between Mobility and Device Performance 170
IV. Concepts of Electronic Transport in Amorphous Semiconductors 183
V. Summary and Conclusions 185
References 186
Chapter 4. Reactor Design for a-Si:H Deposition 190
I. Introduction 190
II. Power Dissipation Mechanisms in SiH4 Discharges 192
III. Material Balance and Gas-Phase and Surface Physicochemistry 206
IV. Concepts of Reactors for a-Si:H Deposition 226
V. Summary and Conclusions 248
References 250
Chapter 5. Optoelectronic Properties of Amorphous Silicon Using the Plasma- Enhanced Chemical Vapor Deposition (PECVD) Technique 256
I. Introduction 256
II. Effect on Properties of a-SiH Due to Parametric Variations Using the PECVD Technique 260
III. Alternative Deposition Techniques 284
IV. Surface States, Interface States, and Their Effect on Device Performance 285
V. Summary 293
References 293
Chapter 6. Amorphous-Silicon-Based Devices 296
I. Introduction 296
II. Significant Advantages of a-Si in Its Alloys as a New Optoelectronic Material 297
III. Progress in Amorphous Silicon Solar Cell Technology 307
IV. Integrated Photosensor and Color Sensor 316
V. Aspect of a-Si Imaging Device Applications 320
VI. a-Si Electrophotographic Applications 321
VII. Visible-Light Thin-Film Light-Emitting Diode (TFLED) 322
References 325
Index 328
Plasma–Materials Interactions 338

Produkt-Details

• Erscheint lt. Verlag: 10.10.1995
• Sprache: englisch
• Themenwelt: Sachbuch/Ratgeber
• Themenwelt: Schulbuch / Wörterbuch
• Themenwelt: Naturwissenschaften ► Physik / Astronomie ► Elektrodynamik
• Themenwelt: Naturwissenschaften ► Physik / Astronomie ► Festkörperphysik
• Themenwelt: Naturwissenschaften ► Physik / Astronomie ► Optik
• Themenwelt: Naturwissenschaften ► Physik / Astronomie ► Plasmaphysik
• Themenwelt: Technik ► Elektrotechnik / Energietechnik
• Themenwelt: Technik ► Maschinenbau
• ISBN-10: 0-08-053910-6 / 0080539106
• ISBN-13: 978-0-08-053910-2 / 9780080539102