Low Temperature Plasmas
Wiley-VCH (Verlag)
978-3-527-40673-9 (ISBN)
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Rainer Hippler is full professor at the Institute of Physics, University of Greifswald. Together with the Max-Planck-Institute for Plasma Physics and the Institute of Low Temperature Plasma Physics in Greifswald the University represents an important center of competence for Plasma Physics and Plasma Technology. His main subjects are complex plasmas including thin film deposition, dusty plasmas, and deposition of nano-size particles on surfaces. Holger Kersten teaches as professor at the Institute of Experimental and Applied Physics, University of Kiel. He is working in the field of plasma physics and plasma technology, with emphasis on complex (dusty) plasmas, plasma surface interaction, and ion beam diagnostics. Martin Schmidt is a leading scientist at the Institute of Low Temperature Plasma Physics in Greifswald, a center of application-oriented research which belongs to the Leibniz-Science Community. Karl H. Schoenbach holds the Batten Endowed Chair for Bioelectrics at Old Dominion University in Norfolk, Virginia, where he serves as Director of the Frank Reidy Research Center for Bioelectrics, a center devoted to research on biological effects of cold plasma and pulsed electric fields.
1 Characteristics of low-temperature plasmas under non-thermal conditions -- a short summary (Alfred Rutscher)
2 Electron kinetics in weakly ionized plasmas (Detlef Loffhagen, Florian Sigeneger and Rolf Winkler)
3 Elementary collision processes in plasmas (Kurt Becker and Chun C. Lin)
4 Elementary processes of plasma-surface interactions (Rainer Hippler)
5 Plasma-Surface-Interaction (Holger Kersten and Achim von Keudell)
6 Fundamentals of Dusty Plasmas (Andr´e Melzer and John Goree)
7 Langmuir probe diagnostics of low-temperature plasmas (Sigismund Pfau and Milan Tichy)
8 Diagnostic emission and absorption spectroscopy of non-equilibrium molecular plasmas (J. Röpcke, P.B. Davies, F. Hempel and B.P. Lavrov)
9 Mass spectrometric diagnostics (Martin Schmidt, Rüdiger Foest and Ralf Basner)
10 Cross-Correlation Emission Spectroscopy Applied to Non-Equilibrium Plasma Diagnostics (Hans-Erich Wagner, Kirill V. Kozlov and Ronny Brandenburg)
11 Ellipsometric analysis of plasma-treated surfaces (Wolfgang Fukarek)
12 Characterization of thin solid films (Harm Wulff and Hartmut Steffen)
13 Plasma sources (Martin Schmidt and Hans Conrads)
14 Reactive non-thermal plasmas, chemical quasi-equilibria, similarity principles and macroscopic kinetics (Hans-Erich Wagner)
15 Atmospheric pressure glow discharges (Alan Garscadden)
16 High-pressure plasmas: dielectric-barrier and corona discharges -- properties and technical applications (Ulrich Kogelschatz and Jürgen Salge)
17 High-Pressure Microdischarges (Kurt H. Becker and Karl H. Schoenbach)
18 Materials applications of high-pressure microplasmas (R. Mohan Sankaran and Konstantinos P. Giapis)
19 Transient Plasma Ignition (Charles Cathey and Martin Gundersen)
20 Transient plasma-assisted diesel exhaust remediation (M. Gundersen, V. Puchkarev, A. Kharlov, G. Roth, J. Yampolsky and D. Erwin)
21 Plasma display panel (J.K. Lee and J.P. Verboncoeur)
22 Low-pressure discharge light sources (Graeme Lister
23 High-pressure plasma light sources (Klaus Günther)
24 EUV Light Sources (Larissa Juschkin, Günther Derra and Klaus Bergmann)
25 Plasma etching in microelectronics (Harald Richter, Steffen Marschmeyer and André Wolff
26 Magnetron Discharges for Thin Film Deposition (Klaus Ellmer)
27 Hollow cathodes and plasma jets for thin film deposition (Zden¡ek Hubi¡cka)
28 Low-temperature plasmas for polymer surface modification (Jürgen Meichsner
29 Plasma-enhanced deposition of superhard thin films (Achim Lunk)
30 Applications of dusty plasmas (Rainer Hippler and Holger Kersten)
31 Plasma assisted surface modification of biointerfaces (Andreas Ohl and Karsten Schröder
32 Cold plasma-based sterilization (Mounir Laroussi)
33 Atmospheric plasma: a universal tool for physicians? (Eva Stoffels)
34 Markets for plasma technology (Klaus-Dieter Weltmann, Martin Schmidt and Kurt Becker)
"... it makes a highly valuable contribution to the subject area and will be accessible to scientists and engineers working in the field." ChemPhysChem"I Think anyone seriously working in this area would find having this book readily available to be a great advantage." ChemPhysChem
| Erscheint lt. Verlag | 29.1.2008 |
|---|---|
| Sprache | englisch |
| Maße | 170 x 240 mm |
| Gewicht | 2038 g |
| Themenwelt | Naturwissenschaften ► Physik / Astronomie ► Atom- / Kern- / Molekularphysik |
| Naturwissenschaften ► Physik / Astronomie ► Plasmaphysik | |
| Schlagworte | Chemie • Chemistry • Component Manufacturing • Dünne Schichten, Oberflächen u. Grenzflächen • Electrical & Electronics Engineering • Electrical & Electronics Engineering • Elektrotechnik u. Elektronik • Festkörperphysik • Komponentenfertigung • Materials Science • Materialwissenschaften • Oberflächen- u. Kolloidchemie • Physics • Physik • Plasma physics • Plasmaphysik • Surface & Colloid Chemistry • Surface & Colloid Chemistry • Thin Films, Surfaces & Interfaces • Thin Films, Surfaces & Interfaces |
| ISBN-10 | 3-527-40673-5 / 3527406735 |
| ISBN-13 | 978-3-527-40673-9 / 9783527406739 |
| Zustand | Neuware |
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