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Intrinsic Point Defects, Impurities, and Their Diffusion in Silicon

Peter Pichler (Autor)

Buch | Hardcover

XXI, 554 Seiten

2004 | 2004
Springer Wien (Verlag)
978-3-211-20687-4 (ISBN)

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Basically all properties of semiconductor devices are influenced by the distribution of point defects in their active areas. This book contains the first comprehensive review of the properties of intrinsic point defects, acceptor and donor impurities, isovalent atoms, chalcogens, and halogens in silicon, as well as of their complexes. Special emphasis is placed on compiling the structures, energetic properties, identified electrical levels and spectroscopic signatures, and the diffusion behavior from experimental and theoretical investigations. In addition, the book discusses the fundamental concepts of silicon and its defects, the electron system, diffusion, thermodynamics, and reaction kinetics which form the scientific basis needed for a thorough understanding of the text. Therefore, the book is able to provide an introduction to newcomers in this field up to a comprehensive reference for experts in process technology, solid-state physics, and simulation of semiconductor processes.

Fundamental Concepts.- 1.1 Silicon and Its Imperfections.- 1.2 The Electron System.- 1.3 Phenomenological and Atomistic Approaches to Diffusion.- 1.4 Thermodynamics.- 1.5 Reaction Kinetics.- 1.6 Exchange of Matter Between Phases.- 2 Intrinsic Point Defects.- 2.1 Concentration in Thermal Equilibrium.- 2.2 Diffusion of Intrinsic Point Defects.- 2.3 Self-Diffusion and Tracer Diffusion.- 2.4 Vacancies.- 2.5 Self-Interstitials.- 2.6 Frenkel Pairs.- 2.7 Bulk Recombination and Bulk Processes.- 2.8 Surface Recombination and Surface Processes.- 2.9 Initial Conditions.- 3 Impurity Diffusion in Silicon.- 3.1 Basic Mechanisms.- 3.2 Impurity-Point-Defect Pairs.- 3.3 Diffusion of Substitutional Impurities via Mobile Complexes with Intrinsic Point Defects.- 3.4 Pair-Diffusion Models.- 3.5 Frank-Turnbull Mechanism.- 3.6 Kick-Out Mechanism.- 4 Isovalent Impurities.- 4.1 Carbon.- 4.2 Germanium.- 4.3 Tin.- 5 Dopants.- 5.1 Dopant Clusters.- 5.2 Ion Pairing.- 5.3 Boron.- 5.4 Aluminum.- 5.5 Gallium.- 5.6 Indium.- 5.7 Nitrogen.- 5.8 Phosphorus.- 5.9 Arsenic.- 5.10 Antimony.- 6 Chalcogens.- 6.1 Oxygen.- 6.2 Sulfur.- 6.3 Selenium.- 6.4 Tellurium.- 7 Halogens.- 7.1 Fluorine.- 7.2 Chlorine.- 7.3 Bromine.- List of Tables.- List of Figures.

Erscheint lt. Verlag	2.6.2004
Reihe/Serie	Computational Microelectronics
Zusatzinfo	XXI, 554 p. 40 illus.
Verlagsort	Vienna
Sprache	englisch
Maße	178 x 254 mm
Gewicht	1185 g
Themenwelt	Naturwissenschaften ► Chemie ► Analytische Chemie
Themenwelt	Technik ► Elektrotechnik / Energietechnik
Schlagworte	acceptor and donor impurities • chalcogens • Halbleiter • halogens • isovalent atoms • semiconductor • Semiconductor Devices • Silicone • Silicone / Silikone • Simulation • Tables • thermodynamics
ISBN-10	3-211-20687-6 / 3211206876
ISBN-13	978-3-211-20687-4 / 9783211206874
Zustand	Neuware