Growth and Characterisation of Semiconductors
Institute of Physics Publishing (Verlag)
978-0-85274-131-3 (ISBN)
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This book explains and evaluates methods used to grow and characterise low-dimensional semiconductor structures. It is based on course material developed in association with the London University Interdisciplinary Research Centre for Semiconductor Materials. It is written for graduates in physics, materials science and electrical engineering working in the research and development of semiconductors.
The basics of epitaxy (D W Pashley). Metal organic chemical vapour deposition (MOCVD) for the preparation of semiconductor materials and devices (J O Williams). Growth of thin films and heterostructures of III-V compounds by molecular beam epitaxy (C T Foxon and B A Joyce). Scanning electron microscopy (SEM) microcharacterisation of semiconducting materials and devices (D B Holt). Depth profiling of semiconductor materials by secondary ion mass spectrometry (J B Clegg). Localised vibrational mode spectroscopy of impurities in semiconductor crystals (R C Newman). Point defect studies using electron paramagnetic resonance (R C Newman). Photoluminescence characterisation (E C Lightowlers). Hall, magnetoresistance and infrared conductivity measurements (R A Stradling). Characterisation of semiconductors by capacitance methods (D W Palmer). High resolution electron microscopy of semiconductors (J L Hutchison).
| Erscheint lt. Verlag | 1.1.1990 |
|---|---|
| Verlagsort | London |
| Sprache | englisch |
| Maße | 156 x 235 mm |
| Gewicht | 454 g |
| Themenwelt | Naturwissenschaften ► Physik / Astronomie ► Elektrodynamik |
| ISBN-10 | 0-85274-131-6 / 0852741316 |
| ISBN-13 | 978-0-85274-131-3 / 9780852741313 |
| Zustand | Neuware |
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