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Characterization in Silicon Processing

Yale Strausser (Autor)

Buch | Hardcover

250 Seiten

1993
Butterworth-Heinemann Ltd (Verlag)
978-0-7506-9172-7 (ISBN)

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This volume is devoted to consideration of the use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. Each chapter treats a type of film used in silicon devices and discusses typical problems seen throughout that film's history, including characterization tools which are most effectively used in clarifying and solving those problems.

Application of Materials Characterization Techniques to Silicon Epitaxial Growth; Polysilicon Conductors; Silicides; Aluminum and/or Copper Conductors; Tungsten Based Conductors; Diffusion Barriers.

Erscheint lt. Verlag	31.10.1993
Reihe/Serie	Materials Characterization
Verlagsort	Oxford
Sprache	englisch
Maße	152 x 229 mm
Gewicht	546 g
Themenwelt	Naturwissenschaften ► Chemie ► Technische Chemie
Themenwelt	Technik ► Maschinenbau
ISBN-10	0-7506-9172-7 / 0750691727
ISBN-13	978-0-7506-9172-7 / 9780750691727
Zustand	Neuware