Ion Beams in Materials Processing and Analysis
Springer Wien (Verlag)
978-3-7091-1733-0 (ISBN)
A comprehensive review of ion beam application in modern materials research is provided, including the basics of ion beam physics and technology. The physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning is treated in detail. Its applications in materials research, development and analysis, developments of special techniques and interaction mechanisms of ion beams with solid state matter result in the optimization of new material properties, which are discussed thoroughly. Solid-state properties optimization for functional materials such as doped semiconductors and metal layers for nano-electronics, metal alloys, and nano-patterned surfaces is demonstrated. The ion beam is an important tool for both materials processing and analysis. Researchers engaged in solid-state physics and materials research, engineers and technologists in the field of modern functional materials will welcome this text.
Klaus Wetzig studied physics at the University of Technology in Dresden, receiving his licence in 1963, his doctorate in 1967 and his habilitation in 1973. In 1975 he moved to the Academy of Sciences, and since 1992 he is Full Professor of Materials Analysis at the University of Technology in Dresden and Director at the Leibniz Institute of Solid State and Materials Research Dresden. His research interests include materials analysis and microstructures, especially electron microscopy of functional materials, characterization of thin films for electronics, and nanostructural features in general.
Preface.- 1. Introduction.- 2. Ion- Solid Interactions.- 2.1 Fundamental Principles.- 2.2 Binary Elastic Collisions.- 2.3 Ion Stopping.- 2.4 Ion Channeling.- 2.5 Ion Induced Target Modifications.- 3. Ion Beam Technology.- 3.1 Principles of Ion Accelerators.- 3.2 Ion Sources.- 3.3 Ion Acceleration.- 3.4 Ion Beam Handling.- 3.5 Ion Implantation Systems.- 3.6 Electrostatic Ion Accelerator Systems.- 3.7 Focused Ion Beam Systems.- 4. Materials Processing.- 4.1 Ion Irradiation Effects in Crystalline Materials.- 4.2 Ion Implantation into Semiconductors.- 4.3 Ion Beam Synthesis of New Phases in Solids.- 4.4 Ion Beam Mixing of Interfaces.- 4.5 Ion Beam Slicing of Thin Layers (Smart-Cut for SOI and Solar Cells).- 4.6 Ion Beam Erosion, Sputtering and Surface Patterning (Ripples and Dots).- 4.7 Ion Beam Shaping of Nanomaterials.- 4.8 Ion Beam Processing of other Materials.- 5. Ion Beam Preparation of Materials.- 5.1 Removal of Target Atoms by Sputtering.- 5.2 Effects on Sputtering Yield.- 5.3 Preparation Steps by Ion Beam Irradiation.- 5.4 Focus Ion Beam (FIB) Preparation.- 6. Ion Beam Analysis by Ion Beams.- 6.1 Introduction.- 6.2 Ion Beam Analytical Techniques - a Survey.- 6.3 Ion Beam Scattering Techniques.- 6.4 Ion Beam Induced Photon Emission.- 6.5 Nuclear Reaction Analysis (NRA).- 6.6 Ion Beam Induced Electron and Light Emission.- 6.7 Secondary Ion Emission.- 6.8 Ion Beam Imaging Techniques.- 7. Special Ion Beam Applications in Materials Analysis Problems.- 7.1 Functional ThinFilms and Layers.- 7.2 Ion Beam Analysis in Art and Archeometry.- 7.3 Special Applications in Life Sciences.- Index.
| Erscheint lt. Verlag | 28.11.2014 |
|---|---|
| Zusatzinfo | IX, 418 p. |
| Verlagsort | Vienna |
| Sprache | englisch |
| Maße | 155 x 235 mm |
| Gewicht | 652 g |
| Themenwelt | Naturwissenschaften ► Physik / Astronomie ► Atom- / Kern- / Molekularphysik |
| Naturwissenschaften ► Physik / Astronomie ► Festkörperphysik | |
| Technik ► Elektrotechnik / Energietechnik | |
| Technik ► Maschinenbau | |
| Schlagworte | ion beams • Materials processing and analysis |
| ISBN-10 | 3-7091-1733-X / 370911733X |
| ISBN-13 | 978-3-7091-1733-0 / 9783709117330 |
| Zustand | Neuware |
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