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Mechanic and Dielectric Properties -

Mechanic and Dielectric Properties (eBook)

Advances in Research and Development

Maurice H. Francombe (Herausgeber)

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2013 | 1. Auflage
397 Seiten
Elsevier Science (Verlag)
978-1-4832-8892-5 (ISBN)
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Mechanic and Dielectric Properties deals with the mechanical and dielectric properties of thin films. Topics covered range from the deposition and mechanical properties of superlattice thin films to the preparation of hard coatings by sputtering and arc evaporation. The use of thin films in microwave acoustics is also discussed, along with ferroelectric films for integrated electronics and the physics, chemistry, and technology of electrochromic tungsten-oxide-based thin films. Comprised of five chapters, this volume begins with an analysis of the growth, characterization, and mechanical behavior of films comprising multilayers primarily of metal and refractory metallic compound components. The next chapter reviews the mechanical properties of hard coatings prepared by sputtering and arc evaporation, together with the influence of multilayer and gradient structures, and of film crystallinity, crystal orientation, and morphology, on properties such as hardness, coating smoothness, and friction behavior. Subsequent chapters focus on the unique role played by piezoelectric films in signal processing devices utilizing bulk or surface acoustic waves; the properties and applications of ferroelectric films in integrated electronics; and the underlying physics and chemistry of electrochromic tungsten-oxide-based thin films. This book should be of interest to physicists.
Mechanic and Dielectric Properties deals with the mechanical and dielectric properties of thin films. Topics covered range from the deposition and mechanical properties of superlattice thin films to the preparation of hard coatings by sputtering and arc evaporation. The use of thin films in microwave acoustics is also discussed, along with ferroelectric films for integrated electronics and the physics, chemistry, and technology of electrochromic tungsten-oxide-based thin films. Comprised of five chapters, this volume begins with an analysis of the growth, characterization, and mechanical behavior of films comprising multilayers primarily of metal and refractory metallic compound components. The next chapter reviews the mechanical properties of hard coatings prepared by sputtering and arc evaporation, together with the influence of multilayer and gradient structures, and of film crystallinity, crystal orientation, and morphology, on properties such as hardness, coating smoothness, and friction behavior. Subsequent chapters focus on the unique role played by piezoelectric films in signal processing devices utilizing bulk or surface acoustic waves; the properties and applications of ferroelectric films in integrated electronics; and the underlying physics and chemistry of electrochromic tungsten-oxide-based thin films. This book should be of interest to physicists.

Front Cover 
1 
Mechanic and Dielectric Properties 4
Copyright Page 
5 
Table of Contents 6
Contributors 10
Preface 12
Chapter 1. Deposition and Mechanical Properties of Superlattice Thin Films 16
I. Introduction 17
II. Deposition Techniques 18
III. Characterization 23
IV. Deposition Mechanisms, Structure, and Stability 37
V. Mechanical Property Measurements 57
VI. Elastic Properties 62
VII. Mechanical Strength and Hardness 74
VIII. Conclusions 86
Acknowledgments 88
References 88
Chapter 2. Hard Coatings Prepared by Sputtering and Arc Evaporation 94
I. Introduction 95
II. Deposition Techniques Based on Sputtering and Evaporation 96
III. Hard Coatings 115
IV. Growth and Properties of Hard Coatings 125
V. Deposition Process 146
VI. Concluding Remarks 153
References 154
Chapter 3. Thin Films in Microwave Acoustics 160
I. Introduction 161
II. Thin Film Materials—Growth and Characterization 163
III. Surface Wave Device Structures 180
IV. Bulk Wave Device Structures 194
V. Emerging Technology 221
VI. Conclusions 233
References 234
Chapter 4. Ferroelectric Films for Integrated Electronics 240
I. Introduction and Background 240
II. Ferroelectric Film Materials 242
III. Growth and Applications—Examples 256
IV. Integrated Electronics Issues 304
V. Conclusions 309
Acknowledgments 310
References 310
Chapter 5. Electrochromic Tungsten-Oxide–Based Thin Films: Physics, Chemistry, and Technology 316
I. Introduction 317
II. Comments on W Oxide Bulk Crystals 319
III. As-deposited Films: Structure and Composition 322
IV. Ion Intercalated Films: Electrochemical Characterization 333
V. Ion Intercalated Films: Physical Characterization 341
VI. Optical Properties 350
VII. Device Data 366
VIII. Summary and Conclusions 377
References 379
Author Index 386
Subject Index 404

Erscheint lt. Verlag 22.10.2013
Mitarbeit Herausgeber (Serie): John L. Vossen
Sprache englisch
Themenwelt Naturwissenschaften Chemie
Naturwissenschaften Physik / Astronomie Festkörperphysik
Naturwissenschaften Physik / Astronomie Mechanik
Naturwissenschaften Physik / Astronomie Optik
Technik Maschinenbau
ISBN-10 1-4832-8892-7 / 1483288927
ISBN-13 978-1-4832-8892-5 / 9781483288925
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