Defects in SiO2 and Related Dielectrics: Science and Technology
Springer (Verlag)
978-0-7923-6685-0 (ISBN)
This book provides a general description of the influence that point defects have on the global properties of the bulk material and their spectroscopic characterization through ESR and optical spectroscopy.
0.- Structure and topology.- Defect-free vitreous networks: The idealised structure of SiO2 and related glasses.- Topology and topological disorder in silica.- Bulk defects.- Optical properties of defects in silica.- The natures of point defects in amorphous silicon dioxide.- Ab initio theory of point defects in SiO2.- A demi-century of magnetic defects in ?-quartz.- Interaction of SiC2 glasses with high energy ion beams and vacuum UV excimer laser pulses.- Excitons, localized states in silicon dioxide and related crystals and glasses.- Gamma rays induced conversion of native defects in natural silica.- Ge and Sn doping in silica: structural changes, optically active defects, paramagnetic sites.- Computational studies of self-trapped excitons in silica.- Surface defects.- Defects on activated silica surface.- Ab-initio molecular dynamics simulation of amorphous silica surface.- Bragg grating.- Periodic UV-induced index modulations in doped-silica optical fibers: formation and properties of the fiber Bragg grating.- Bulk silicas prepared by low pressure plasma CVD: formation of structure and point defects.- Change of spectroscopic and structural properties of germanosilicate glass under mechanical compression and UV irradiation.- UV photoinduced phenomena in oxygen-deficient silica glasses.- One- and two-quantum UV photo-reactions in pure and doped silica glasses. 2. Germanium oxygen deficient centers (GODC).- Photoinduced refractive index change and second harmonic generation in MCVD germanosilicate core fibres fabricated in reduced (nitrogen and helium) atmospheres.- Si/SiC2 interface and gate dielectrics.- Molecular hydrogen interaction kinetics of interfacial Si dangling bonds in thermal (111)Si/SiO2. An electron spin resonance saga.- Ultrathin oxide films foradvanced gate dielectrics applications Current progress and future challenges.- SiC/SiO2 interface defects.- Point defects in Si-SiO2 systems: current understanding.
Erscheint lt. Verlag | 31.12.2000 |
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Reihe/Serie | NATO Science Series II: Mathematics, Physics and Chemistry ; 2 |
Zusatzinfo | 87 Illustrations, black and white; VIII, 624 p. 87 illus. |
Verlagsort | Dordrecht |
Sprache | englisch |
Maße | 155 x 235 mm |
Themenwelt | Naturwissenschaften ► Physik / Astronomie ► Elektrodynamik |
Naturwissenschaften ► Physik / Astronomie ► Festkörperphysik | |
Naturwissenschaften ► Physik / Astronomie ► Thermodynamik | |
Technik ► Maschinenbau | |
ISBN-10 | 0-7923-6685-9 / 0792366859 |
ISBN-13 | 978-0-7923-6685-0 / 9780792366850 |
Zustand | Neuware |
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