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Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System - Seiji Samukawa

Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System

(Autor)

Buch | Softcover
40 Seiten
2014 | 2014 ed.
Springer Verlag, Japan
978-4-431-54794-5 (ISBN)
CHF 74,85 inkl. MwSt
This book provides for the first time a good understanding of the etching profile technologies that do not disturb the plasma. Three types of sensors are introduced: on-wafer UV sensors, on-wafer charge-up sensors and on-wafer sheath-shape sensors in the plasma processing and prediction system of real etching profiles based on monitoring data. Readers are made familiar with these sensors, which can measure real plasma process surface conditions such as defect generations due to UV-irradiation, ion flight direction due to charge-up voltage in high-aspect ratio structures and ion sheath conditions at the plasma/surface interface. The plasma etching profile realistically predicted by a computer simulation based on output data from these sensors is described.

Prof. Seiji Samukawa Distinguished Professor in Tohoku University Professor in Institute of Fluid Science, Professor and Principal Investigator, WPI-AIMR in Tohoku University.

Introduction.- On-wafer UV sensor and prediction of UV irradiation damage.- Prediction of Abnormal Etching Profiles in High-aspect-ratio Via/Hole Etching Using On-wafer Monitoring System.- Feature Profile Evolution in Plasma Processing Using Wireless On-wafer Monitoring System.

Reihe/Serie SpringerBriefs in Applied Sciences and Technology
Zusatzinfo 30 Illustrations, color; 5 Illustrations, black and white; VIII, 40 p. 35 illus., 30 illus. in color. With online files/update.
Verlagsort Tokyo
Sprache englisch
Maße 155 x 235 mm
Themenwelt Naturwissenschaften Physik / Astronomie Plasmaphysik
Technik Elektrotechnik / Energietechnik
Schlagworte Etching Profile • On-wafer Monitoring Technique • On-wafer UV Sensor • ULSI • Ultralarge Scaled Integrated Circuit • Ultralarge-scale integrated circuit (ULSI)
ISBN-10 4-431-54794-0 / 4431547940
ISBN-13 978-4-431-54794-5 / 9784431547945
Zustand Neuware
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