Nicht aus der Schweiz? Besuchen Sie lehmanns.de
Für diesen Artikel ist leider kein Bild verfügbar.

High–K Gate Dielectrics for CMOS Technology

G He (Autor)

Software / Digital Media
590 Seiten
2012
Wiley-VCH Verlag GmbH (Hersteller)
978-3-527-64634-0 (ISBN)
CHF 319,95 inkl. MwSt
  • Keine Verlagsinformationen verfügbar
  • Artikel merken

Gang He is Professor at the School of Physics and Materials Science of the Anhui University, China. He obtained his academic degrees from the Institute of Solid State Physics of the Chinese Academy of Sciences. His research interests and efforts cover the areas of the preparation, characterization, fundamental understanding and associated applications of high-k gate dielectric thin films. Due to his outstanding performance in research work, he won a scholarship award from the Chinese Academy of Sciences in 2005 and a grant of the Japanese Society for the Promotion of Science in 2006. Zhaoqi Sun is the President of the School of Physics and Materials Science at the Anhui University. He graduated from Sichuan University and obtained his academic degrees from the University of Science and Technology of China. His research is focused on functional thin film materials for applications in microelectronics. Zhaoqi Sun has authored more than 140 scientific publications and has received numerous scientific awards, including the Science and Technology Award of the Anhui Province and an Outstanding Teacher Award.

Erscheint lt. Verlag 24.8.2012
Verlagsort Weinheim
Sprache englisch
Maße 170 x 240 mm
Gewicht 666 g
Themenwelt Naturwissenschaften Physik / Astronomie Elektrodynamik
Technik Elektrotechnik / Energietechnik
Technik Maschinenbau
ISBN-10 3-527-64634-5 / 3527646345
ISBN-13 978-3-527-64634-0 / 9783527646340
Zustand Neuware
Haben Sie eine Frage zum Produkt?