X-Ray Diffuse Scattering from Self-Organized Mesoscopic Semiconductor Structures
Springer Berlin (Verlag)
978-3-642-05769-4 (ISBN)
This monograph represents a critical survey of the outstanding capabilities of X-ray
diffuse scattering for the structural characterization of mesoscopic material systems. The mesoscopic regime comprises length scales ranging from a few up to some hundreds of nanometers. It is of particular relevance at semiconductor layer systems where, for example, interface roughness or low-dimensional objects such as quantum dots and quantum wires have attracted much interest. An extensive overview of the present state-of-the-art theory of X-ray diffuse scattering at mesoscopic structures is given followed by a valuable description of various experimental techniques. Selected up-to-date examples are discussed. The aim of the present book is to combine aspects of self-organized growth of mesoscopic structures with corresponding X-ray diffuse scattering experiments.
A Brief Introduction to the Topic.- Basic Principles of X-Ray Diffuse Scattering on Mesoscopic Structures.- Experimental Optimization.- A Model System: LPE SiGe/Si(001) Islands.- Dynamical Scattering at Grazing Incidence.- Characterization of Quantum Dots.- Characterization of Interface Roughness.- Appendix.
Erscheint lt. Verlag | 1.12.2010 |
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Reihe/Serie | Springer Tracts in Modern Physics |
Zusatzinfo | X, 204 p. |
Verlagsort | Berlin |
Sprache | englisch |
Maße | 155 x 235 mm |
Gewicht | 331 g |
Themenwelt | Naturwissenschaften ► Physik / Astronomie ► Elektrodynamik |
Naturwissenschaften ► Physik / Astronomie ► Optik | |
Technik ► Elektrotechnik / Energietechnik | |
Technik ► Maschinenbau | |
Schlagworte | mesoscopic systems • quantum dot • scattering • Self-organized growth • semiconductor • Semiconductors nanostructures • X-ray diffuse scattering |
ISBN-10 | 3-642-05769-1 / 3642057691 |
ISBN-13 | 978-3-642-05769-4 / 9783642057694 |
Zustand | Neuware |
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