High Density Plasma Sources
Design, Physics and Performance
Seiten
1996
William Andrew Publishing (Verlag)
978-0-8155-1377-3 (ISBN)
William Andrew Publishing (Verlag)
978-0-8155-1377-3 (ISBN)
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Describes the design, physics, and performance of high density plasma sources which have been explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and other applications.
This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.
This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.
Helicon Plasma SourcesPlanar Inductive SourcesElectrostatically-Shielded Inductively-Coupled RF Plasma SourcesVery High Frequency Capacitive Plasma SourcesSurface Wave Plasma SourcesMicrowave Plasma Disk Processing MachinesElectron Cyclotron Resonance Plasma SourcesDistributed ECR Plasma SourcesReferencesIndex
| Erscheint lt. Verlag | 31.12.1996 |
|---|---|
| Verlagsort | Norwich |
| Sprache | englisch |
| Maße | 152 x 229 mm |
| Gewicht | 880 g |
| Themenwelt | Naturwissenschaften ► Physik / Astronomie ► Plasmaphysik |
| Technik | |
| ISBN-10 | 0-8155-1377-1 / 0815513771 |
| ISBN-13 | 978-0-8155-1377-3 / 9780815513773 |
| Zustand | Neuware |
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