Design for Manufacturability and Yield for Nano-Scale CMOS

Charles Chiang, Jamil Kawa (Autoren)

Buch | Softcover

255 Seiten

2010 | Softcover reprint of hardcover 1st ed. 2007
Springer (Verlag)
978-90-481-7303-7 (ISBN)

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Design for Manufacturability and Yield for Nano-Scale CMOS walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process and how to address each aspect at the proper design step starting with the design and layout of standard cells and how to yield-grade libraries for critical area and lithography artifacts through place and route, CMP model based simulation and dummy-fill insertion, mask planning, simulation and manufacturing, and through statistical design and statistical timing closure of the design. It alerts the designer to the pitfalls to watch for and to the good practices that can enhance a design’s manufacturability and yield. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development.

Dr. Charles Chiang is R&D Director of the Advanced Technology Group at Synopsys Inc. in Mountain View, CA, USA

Random Defects.- Systematic Yield - Lithography.- Systematic Yield - Chemical Mechanical Polishing (CMP).- Variability & Parametric Yield.- Design for Yield.- Yield Prediction.- Conclusions.

Erscheint lt. Verlag	22.11.2010
Reihe/Serie	Integrated Circuits and Systems
Zusatzinfo	XXVII, 255 p.
Verlagsort	Dordrecht
Sprache	englisch
Maße	155 x 235 mm
Themenwelt	Mathematik / Informatik ► Informatik ► Software Entwicklung
	Mathematik / Informatik ► Informatik ► Theorie / Studium
	Informatik ► Weitere Themen ► CAD-Programme
	Technik ► Elektrotechnik / Energietechnik
Schlagworte	CAD (Computer aided design) • CAE (Computer aided engineering)
ISBN-10	90-481-7303-5 / 9048173035
ISBN-13	978-90-481-7303-7 / 9789048173037
Zustand	Neuware