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Digital Diffractive Optics - Bernard C. Kress, Patrick Meyrueis

Digital Diffractive Optics

An Introduction to Planar Diffractive Optics and Related Technology
Buch | Hardcover
396 Seiten
2000
John Wiley & Sons Inc (Verlag)
978-0-471-98447-4 (ISBN)
CHF 519,95 inkl. MwSt
Diffractive optical elements (DOEs) are becoming more and more widely used in a braod range of fields, including telecommunications, optical computing, consumer electronics, laser material processing and the biomedical sciences, to manipulate light through micro-optical systems. In order to get the most out of such DOEs, knowledge of the design process, fabrication, packaging in a particular system, and operation is required.

Digital Diffractive Optics discusses in detail the design and simulation of DOEs, before considering the main fabrication techniques. The increasingly important CAD/CAM tool requirements for the production of DOEs are covered, and a chapter is devoted to the crucial area of systematic fabrication error compensation. Finally, the integration and use of DOEs in a number of different systems, including various opto-electronic and opto-mechanical systems, are discussed.

Digital Diffractive Optics will be of great interest to all those involved in the fields of optical engineering and photonics. It presents a clear view of the whole process, from design to fabrication and application, without overstressing the, often complex, mathematics, and will thus be accessible to postgraduate students and those entering the field, as well as more experienced engineers and scientists.

Bernard has published numerous books and book chapters on micro-optics and has more than 30 patents granted worldwide. He is a short course instructor for the SPIE and was involved in numerous SPIE conferences as technical committee member and conference co-chair.

Introduction: From Diffraction to Diffractive Optics.

Design and Simulation of Diffractive Optical Elements.

DOE Fabrication and Replication Techniques.

CAD/CAM Tools for DOEs.

DOE Fabrication Tolerancing Analysis.

DOE Mask Layout Generation.

System-Oriented DOE Designs: Examples.

Conclusion.

Index.

Erscheint lt. Verlag 25.10.2000
Verlagsort New York
Sprache englisch
Maße 159 x 233 mm
Gewicht 737 g
Themenwelt Informatik Weitere Themen CAD-Programme
Naturwissenschaften Physik / Astronomie
Technik
ISBN-10 0-471-98447-7 / 0471984477
ISBN-13 978-0-471-98447-4 / 9780471984474
Zustand Neuware
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