Interlayer Dielectrics for Semiconductor Technologies
Seiten
2003
Academic Press Inc (Verlag)
978-0-12-511221-5 (ISBN)
Academic Press Inc (Verlag)
978-0-12-511221-5 (ISBN)
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Semiconductor technologies are moving at such a fast pace that new materials are needed in all types of application. This work covers the science, properties and applications of dielectrics, their preparation, patterning, reliability and characterisation. It brings together the science and technology of interlayer dielectrics materials.
Semiconductor technologies are moving at such a fast pace that new materials are needed in all types of application. Manipulating the materials and their properties at atomic dimensions has become a must. This book presents the case of interlayer dielectrics materials whilst considering these challenges.
Interlayer Dielectrics for Semiconductor Technologies cover the science, properties and applications of dielectrics, their preparation, patterning, reliability and characterisation, followed by the discussion of different materials including those with high dielctric constants and those useful for waveguide applications in optical communications on the chip and the package.
Semiconductor technologies are moving at such a fast pace that new materials are needed in all types of application. Manipulating the materials and their properties at atomic dimensions has become a must. This book presents the case of interlayer dielectrics materials whilst considering these challenges.
Interlayer Dielectrics for Semiconductor Technologies cover the science, properties and applications of dielectrics, their preparation, patterning, reliability and characterisation, followed by the discussion of different materials including those with high dielctric constants and those useful for waveguide applications in optical communications on the chip and the package.
By Shyam P Muraka
Dialectric Properties, Characterization of Low Dielectric Constant Materials, Compatibilities of Dielectric Film, Silicon Based Dielectrics, Low K Polymers, Chemical Vapour Deposition of CF Low K Materials, Nanoporous Dielectric Films: Fundamental Property Relations and Microelectronic Applications, High K Dielectrics Grown by Atomic Layer Disposition, Dielectric Materials in Optical Waveguide Applications, Reliability, Future Trends in Silicon Technologies.
Erscheint lt. Verlag | 13.10.2003 |
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Zusatzinfo | Approx. 200 illustrations; Illustrations |
Verlagsort | San Diego |
Sprache | englisch |
Maße | 165 x 240 mm |
Gewicht | 1040 g |
Themenwelt | Technik ► Elektrotechnik / Energietechnik |
ISBN-10 | 0-12-511221-1 / 0125112211 |
ISBN-13 | 978-0-12-511221-5 / 9780125112215 |
Zustand | Neuware |
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