Handbook of Thin Film Deposition
Seiten
2012
|
3rd edition
William Andrew Publishing (Verlag)
978-1-4377-7873-1 (ISBN)
William Andrew Publishing (Verlag)
978-1-4377-7873-1 (ISBN)
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Focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, this book is for memory applications and methods for thin film optical processes.
The Handbook of Thin Film Deposition is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, new materials for memory applications and methods for thin film optical processes. In a major restructuring, this edition of the handbook lays the foundations with an up-to-date treatment of lithography, contamination and yield management, and reliability of thin films. The established physical and chemical deposition processes and technologies are then covered, the last section of the book being devoted to more recent technological developments such as microelectromechanical systems, photovoltaic applications, digital cameras, CCD arrays, and optical thin films.
The Handbook of Thin Film Deposition is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, new materials for memory applications and methods for thin film optical processes. In a major restructuring, this edition of the handbook lays the foundations with an up-to-date treatment of lithography, contamination and yield management, and reliability of thin films. The established physical and chemical deposition processes and technologies are then covered, the last section of the book being devoted to more recent technological developments such as microelectromechanical systems, photovoltaic applications, digital cameras, CCD arrays, and optical thin films.
Krishna Seshan was an Assistant Professor in Materials Science at the University of Arizona with extensive professional experience as a technologist at both IBM and Intel Corporations. Dr. Seshan passed away in 2017.
Foreword to the Third Edition
Scaling of Devices and Thermal Scaling
PVD - Special Topics
CVD New Developments
CVD Equipment
CMP Method and Practice
Process Technology for Copper Interconnects
Optical Thin Films
Thin Films in Photovoltaics
Thin Films in Memory Applications
Index
| Erscheint lt. Verlag | 19.7.2012 |
|---|---|
| Verlagsort | Norwich |
| Sprache | englisch |
| Maße | 152 x 229 mm |
| Gewicht | 690 g |
| Themenwelt | Technik ► Elektrotechnik / Energietechnik |
| Technik ► Maschinenbau | |
| ISBN-10 | 1-4377-7873-9 / 1437778739 |
| ISBN-13 | 978-1-4377-7873-1 / 9781437778731 |
| Zustand | Neuware |
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