Handbook of Sputter Deposition Technology
Principles, Technology and Applications
Seiten
1992
William Andrew Publishing (Verlag)
978-0-8155-1280-6 (ISBN)
William Andrew Publishing (Verlag)
978-0-8155-1280-6 (ISBN)
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Cathode sputtering is used in the microelectronics industry for silicon integrated circuit production and for metallurgical coatings. High temperature superconductors can be synthesized with sputtering under non-equilibrium conditions. This book presents an overview of sputter deposition technology, a key technology for materials research.
A concise, comprehensive overview of sputter deposition technologyùa key technology for materials research in the next decade.
Cathode sputtering is widely used in the microelectronics industry for silicon integrated circuit production and for metallurgical coatings. High temperature superconductors can be synthesized with sputtering under non-equilibrium conditions. Diamond films and ferroelectric materials are other applications.
A concise, comprehensive overview of sputter deposition technologyùa key technology for materials research in the next decade.
Cathode sputtering is widely used in the microelectronics industry for silicon integrated circuit production and for metallurgical coatings. High temperature superconductors can be synthesized with sputtering under non-equilibrium conditions. Diamond films and ferroelectric materials are other applications.
Thin Film Materials and Devices
Thin Film Processes
Sputtering Phenomena
Sputtering Systems
Deposition of Compound Thin Films
Microfabrication by Sputtering
Future Directions
Erscheint lt. Verlag | 31.12.1992 |
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Verlagsort | Norwich |
Sprache | englisch |
Maße | 152 x 229 mm |
Gewicht | 570 g |
Themenwelt | Technik ► Elektrotechnik / Energietechnik |
ISBN-10 | 0-8155-1280-5 / 0815512805 |
ISBN-13 | 978-0-8155-1280-6 / 9780815512806 |
Zustand | Neuware |
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