Glow Discharge Processes

Sputtering and Plasma Etching

Brian Chapman (Autor)

Buch | Hardcover

432 Seiten

1980
Wiley-Interscience (Verlag)
978-0-471-07828-9 (ISBN)

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Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.

Brian Chapman is the author of Glow Discharge Processes: Sputtering and Plasma Etching, published by Wiley.

Gases.

Gas Phase Collision Processes.

Plasmas.

DC Glow Discharges.

RF Discharges.

Sputtering.

Plasma Etching.

Appendices.

Index.

Erscheint lt. Verlag	5.11.1980
Sprache	englisch
Maße	164 x 241 mm
Gewicht	848 g
Themenwelt	Naturwissenschaften ► Physik / Astronomie ► Elektrodynamik
ISBN-10	0-471-07828-X / 047107828X
ISBN-13	978-0-471-07828-9 / 9780471078289
Zustand	Neuware